The sputtering target refers to the sputtering source of various functions films on the substrate through magnetron sputtering, multi-arc or other types of sputtering system under a appropriate process.                Target materials relate to metal, ceramics, as well as composites and their compounds. Because of different properties of the materials, they are used for the sputtering target, to deposit continuous film on the different material surface through vacuum sputtering, thus to bring new features for the original body materials. As one of the earliest units specialized in sputtering Targets, Zhengzhou Sanhui has become a professional targets manufacturer based on its own strong technology and equipment advantages. Our company owns manufacturing equipment such as large HIP/CIP machine, vacuum induction melting furnace and large cold/hot rolling machine as well as the machine workshop, thus to provide the various types of pure metal and alloy target of high quality for the industries such as glass, Mechanical machining, TFT-LCD, Automotive, Energy, Household appliances, Semiconductors, Magnetic data storage, Optical data storage. In addition to the foreign customers, the target products of our company have been exported to countries such as the United States, Germany, France, Japan, Singapore and South Korea. Under the guarantee of three systems-ISO9000/14000/18000, the product quality is recognized by the users.