The purity of the target has a great influence on the properties of the sputtered jet film. The higher the purity of the target is, the better the performance of the sputtered jet film is. Taking A1 target as an example, the higher the purity is, the corrosion resistance of the sputtered A1 film and electrical and optical properties is better. However, in practical applications, the requirements for purity of different target materials are different. For example, general industrial target materials are not demanding for purity, and target purity in semiconductor, display and other fields is very strict. The purity requirement of target material for magnetic thin film is generally more than 99.9%. The purity of In2O3 and SnO2 in ITO target is not less than 99.99%.
Compactness:
In order to reduce the porosity in the target solid and improve the performance of the film, the sputtering target is generally required to have higher compactness. Generally, the density of the target affects not only the deposition rate at sputtering, the density and discharge phenomena of the sputtered film particles, but also the electrical and optical properties of the sputtered films. The target is dense, the lower the density of particles sputtered film, discharge phenomenon is weak, and the film performance is also better. The density of the target depends mainly on the preparation process. Generally speaking, the density of the casting target is high, but the compactness of the sintered target is relatively low. Therefore, improving the density of target is one of the key technologies for the preparation of target materials by sintering.
Composition and structure uniformity:
Composition and structure uniformity are investigated.
Uniformity of composition and structure is one of the important indexes to evaluate the quality of target. For the composite alloy target and composite target, it not only requires the uniformity of the composition, but also requires the uniformity of the structure.
